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Fundamental studies of the plasma extraction and ion beam formation processes in inductively coupled plasma mass spectrometry

机译:电感耦合等离子体质谱法中等离子体提取和离子束形成过程的基础研究

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摘要

The fundamental and practical aspects are described for extracting ions from atmospheric pressure plasma sources into an analytical mass spectrometer. Methodologies and basic concepts of inductively coupled plasma mass spectrometry (ICP-MS) are emphasized in the discussion, including ion source, sampling interface, supersonic expansion, skimming process, ion optics and beam focusing, and vacuum considerations. Some new developments and innovative designs are introduced;The plasma extraction process in ICP-MS was investigated by Langmuir measurements in the region between the skimmer and first ion lens. Electron temperature (T e) is in the range 2000-11000 K and changes with probe position inside an aerosol gas flow. Electron density (n e) is in the range 108-1010 cm-3 near the skimmer tip and drops abruptly to 106-108 cm-3 downstream further behind the skimmer. Electron density in the beam leaving the skimmer also depends on water loading and on the presence and mass of matrix elements;Axially resolved distributions of electron number density and electron temperature were obtained to characterize the ion beam at a variety of plasma operating conditions. The electron density dropped by a factor of 103 along the centerline between the sampler and skimmer cones in the first stage and continued to drop by factors of 104-105 downstream of skimmer to the entrance of ion lens. The electron density in the beam expansion behind sampler cone exhibited a 1/z2 intensity fall-off (z is the axial position). A second beam expansion originated from the skimmer entrance, and the beam flow underwent with another 1/z2 fall-off behind the skimmer. Skimmer interactions play an important role in plasma extraction in the ICP-MS instrument;The measured floating voltages (V f) are in the range of +2 to +5 volts. V f generally decreases downstream of sampler and through the skimmer. Negative values of Vf were measured at downstream of the skimmer. RF amplitude shows a net positive potential in supersonic expansion. The plasma \u22rectification effect\u22 and the \u22calorelectric effect\u22 on the plasma potential measurements were discussed. The drop in V f near the skimmer may be caused by a disturbance in front of the skimmer. ftn1This work was performed at the Ames Laboratory under contract No. W-7405-ENG-82 with the U.S. Department of Energy. The United States government has assigned the DOE report no. IS-T 1713 to this dissertation.
机译:描述了用于从大气压等离子体源中提取离子到分析质谱仪中的基本方面和实际方面。讨论中着重介绍了电感耦合等离子体质谱法(ICP-MS)的方法和基本概念,包括离子源,采样接口,超音速膨胀,撇渣过程,离子光学和束聚焦以及真空注意事项。介绍了一些新的进展和创新的设计;通过撇渣器和第一个离子透镜之间的区域的Langmuir测量研究了ICP-MS中的等离子体萃取过程。电子温度(T e)在2000-11000 K范围内,并随气溶胶气流内探头位置的变化而变化。分离器尖端附近的电子密度(n e)在108-1010 cm-3的范围内,并在分离器后面的下游突然下降至106-108 cm-3。离开撇渣器的电子束中的电子密度还取决于水负荷以及基质元素的存在和质量;获得了轴向解析的电子数密度和电子温度分布,以表征各种等离子体操作条件下的离子束。在第一阶段中,电子密度沿采样器和撇渣锥之间的中心线下降了103倍,而在撇渣器下游离子透镜入口处的电子密度继续下降了104-105倍。采样锥后面的电子束扩展中的电子密度显示出1 / z2的强度下降(z是轴向位置)。第二个光束扩展来自分离器入口,光束流经过分离器后面的另一个1 / z2衰减。撇渣器相互作用在ICP-MS仪器的血浆提取中起着重要作用;测得的浮动电压(V f)在+2至+5伏特的范围内。 V f通常在采样器的下游并通过分离器降低。在分离器的下游测量了Vf的负值。射频振幅在超音速膨胀中显示出净正电位。讨论了等离子体对等离子体电势测量的整流作用和热电效应。撇渣器附近的V f下降可能是由于撇渣器前面的干扰引起的。 ftn1这项工作是在Ames实验室根据与美国能源部签订的W-7405-ENG-82合同进行的。美国政府已将DOE报告编号为。 IS-T 1713到此论文。

著录项

  • 作者

    Niu, Hongsen;

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  • 年度 1994
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  • 原文格式 PDF
  • 正文语种 en
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